Quartz (Optical, Synthetic, Fused)
Properties of quartz glass
| Optical Transparency |
Quartz has high optical transparency for
wide varieties of wavelength such as UV and infrared. Especially it
has greater optical transparency in shorter wavelength. |
| High purity |
Quartz glass has very high purity. Thus there are only minute impurities in the glass. This makes it suitable for semiconductor processing and liquid crystal manufacturing which hates impurities such as alkali. |
| Heat Resistance |
It has excellent heat resistance and thermal shock resistance from low-thermal expansion. Low thermal conductivity and low-temperature specific heat is one of the properties. |
| Chemical Resistance |
It is chemically very stable as chemical and has excellent chemical resistance. |
There are two kinds of quartz glass. One is fused quartz which is produced by natural crystal powder. The other one is synthetic quartz which is produced from silicon tetrachloride. DAICO will choose the best material according to customer requests.
Optical Synthetic Silica
Quartz glass is high purity optical material which has optical transparency,
heat resistance and corrosion resistance. DAICO’s USQ-E series
is high quality optical synthetic silica which has very high
purity, high homogeneous and great optical transparency especially in
UV region compared to other glass.
It is ideal especially for optical
parts (lens, window, mirror, prism) for high-power UV device
such as exposure equipments and excimer lasers.
Index of refraction |
(Temperature：25℃、Moisture：50%) |
| Wavelength（nm） |
Index of refraction |
Wavelength（nm） |
Index of refraction |
| 157.6 （F2） |
1.661469 |
587.562 （d） |
1.458504 |
| 193.4 （ArF） |
1.560165 |
589.294 （D） |
1.458443 |
| 248.3 （KrF） |
1.508432 |
632.8 （He-Ne） |
1.457059 |
| 365.015 （I） |
1.474581 |
656.273 （C） |
1.456408 |
| 404.656 （h） |
1.469664 |
706.519 （r） |
1.455186 |
| 435.835 （g） |
1.466738 |
852.11 （s） |
1.452505 |
| 486.133 （F） |
1.463166 |
1013.98 （t） |
1.450284 |
| 546.074 （e） |
1.460118 |
1082.989 （He） |
1.449449 |
| ※This is typical analytical value and not guaranteed value. |
Abbe number |
Mean Dispersion |
 |
 |
Light Transmission Characteeristics
Homogeneity data
|
 |
※An example of homogeneity（⊿ｎ）
・Size：350φ×160ｔ
・⊿ｎ＝1.3×10-6
|
High-purity clear quartz
High-purity clear quartz is used in process of semiconductor and flat
panel display manufacturing, and for illuminated light sources
and laboratory equipments taking advantage of its’ properties such as
high purity, heat resistance and electric insulation.
| |
|
Al |
Ca |
Cu |
Fe |
Na |
K |
Li |
Mg |
OH |
|
Fused Quartz |
Oxyhydrogen fusion |
9 |
0.6 |
<0.02 |
0.6 |
0.6 |
0.1 |
<0.02 |
0.04 |
200 |
|
Electric Fused |
15 |
0.6 |
0.02 |
0.2 |
0.8 |
0.6 |
0.5 |
0.1 |
10 |
|
Synthetic Silica |
ＣＶＤ method |
0.1 |
0.1 |
<0.02 |
0.05 |
0.05 |
0.05 |
0.05 |
<0.02 |
1000 |
| ＶＡＤ method |
<0.02 |
<0.02 |
<0.02 |
<0.02 |
<0.02 |
<0.02 |
<0.02 |
<0.02 |
<100 |
| ※This is typical analytical value and not guaranteed value. |
 |
Examples of product
Manufacturing process of Semiconductor and display
Tube, Boat, Chamber、Quartz bath, Jig for dry process
Illuminated light sources
Arc tube material, Lump constituent material
Laboratory devices
Spectrophotometer cell, Organic element analyzer, Thermal analysis
glass equipment, wool. |
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